Hui-Ying Lu

Title: Hui-Ying Lu: Innovator in FinFET Technology

Introduction

Hui-Ying Lu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of FinFET devices. His innovative approach has led to advancements that are crucial for modern electronics.

Latest Patents

Hui-Ying Lu holds a patent for a FinFET device and method of forming the same. This patent describes a method that includes depositing a first conductive material in an opening between a first semiconductor structure and a second semiconductor structure. The first conductive material comprises at least one first void. The method further involves removing a portion of the first conductive material to create a trench, which exposes the first void and is defined by the remaining portion of the first conductive material. Finally, a second conductive material is deposited in the trench, forming a dummy gate layer alongside the remaining portion of the first conductive material.

Career Highlights

Hui-Ying Lu is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this esteemed company has allowed him to be at the forefront of technological advancements in semiconductor manufacturing.

Collaborations

Hui-Ying Lu has collaborated with notable colleagues, including Ping Hung Li and Lun-Kuang Tan. These collaborations have fostered an environment of innovation and have contributed to the success of their projects.

Conclusion

Hui-Ying Lu's contributions to FinFET technology exemplify his dedication to advancing semiconductor technology. His innovative methods and collaborations continue to influence the industry positively.