This inventor holds 1 USPTO granted patent. Top assignee: Agere Systems Inc.. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: Innovations of Hui Ma in Material Defect Detection
Introduction
Hui Ma is an accomplished inventor based in Gainesville, FL (US). He has made significant contributions to the field of material science, particularly in the detection of defects in materials. His innovative approach has led to the development of a patented method that enhances the accuracy of defect detection.
Latest Patents
Hui Ma holds a patent titled "Method for detecting defects in a material and a system for accomplishing the same." This invention provides a systematic approach to identifying defects on the surface of materials. The method involves obtaining an image of a material's surface and converting it into an intensity profile. By analyzing this profile, defects can be determined, which is crucial for ensuring material integrity. In one exemplary embodiment, the image is captured using a scanning electron microscope, allowing for precise defect analysis. The method can also be utilized to assess defect density on the material's surface. Hui Ma has 1 patent to his name.
Career Highlights
Hui Ma is associated with Agere Systems Inc., where he applies his expertise in material science. His work at the company has been instrumental in advancing technologies related to material defect detection. His innovative methods have the potential to impact various industries that rely on high-quality materials.
Collaborations
Hui Ma has collaborated with notable colleagues, including Catherine B Vartuli and Erik Cho Houge. These collaborations have fostered a productive environment for innovation and research in material science.
Conclusion
Hui Ma's contributions to the field of material defect detection exemplify the importance of innovation in technology. His patented methods not only enhance the understanding of material integrity but also pave the way for advancements in various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
