Hui-Ling Shang

Title: Hui-Ling Shang: Innovator in Semiconductor Technology

Introduction

Hui-Ling Shang is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of gate spacers that enhance device performance. With a total of 2 patents, his work is recognized for its innovative approach to reducing dielectric constants in semiconductor devices.

Latest Patents

Hui-Ling Shang's latest patents focus on the dielectric constant reduction of gate spacers. The first patent describes a semiconductor device that includes a substrate, a gate stack over the substrate, and a gate spacer on the sidewall of the gate stack. This gate spacer consists of an outer spacer and an inner spacer, both containing the same k-value reduction impurities. Notably, the concentration of these impurities in the inner spacer is greater than in the outer spacer. The second patent outlines a method that begins with forming a dummy gate structure over a substrate. It involves creating a plurality of gate spacers on opposite sidewalls of the dummy gate structure, which initially have a first dielectric constant. After removing the dummy gate structure, a gate trench is formed, and a dopant source layer is introduced to diffuse k-value reduction impurities into the gate spacers, effectively lowering their dielectric constant.

Career Highlights

Hui-Ling Shang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing the technology used in modern semiconductor devices. His innovative methods and designs have contributed to the efficiency and performance of these devices.

Collaborations

Hui-Ling Shang has collaborated with notable colleagues in his field, including Xu-Sheng Wu and Chang-Miao Liu. These collaborations have fostered a productive environment for innovation and development in semiconductor technology.

Conclusion

Hui-Ling Shang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor devices, showcasing the importance of innovation in technology.