Hui-Kow Lim

Title: Innovations by Hui-Kow Lim in Semiconductor Manufacturing

Introduction

Hui-Kow Lim is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor manufacturing. His innovative work has led to the development of a unique patent that enhances the lithographic process used in integrated circuit device fabrication.

Latest Patents

Hui-Kow Lim holds a patent for an "In-line focus monitor structure and method using top-down SEM." This invention relates to a test structure formed on a reticle simultaneously with a pattern intended for building integrated circuit devices. The test structure features a large rectangular end with several rectangular shapes extending in a parallel array. The dimensions of these extensions are designed to match the minimum feature size in the lithographic process being monitored. A CD SEM is employed to measure the edge width of both convex and concave sections of the structure as printed in photoresist at various focus settings. The resulting plot of edge width versus focus setting allows for the determination of the optimal focus setting for the lithographic process.

Career Highlights

Hui-Kow Lim has made significant strides in his career, particularly through his work at Chartered Semiconductor Manufacturing Ltd. His expertise in semiconductor technology has positioned him as a key player in the industry.

Collaborations

Hui-Kow Lim has collaborated with notable colleagues, including Ron Lopez and Teng Hwee Ng, contributing to advancements in semiconductor manufacturing processes.

Conclusion

Hui-Kow Lim's innovative contributions to semiconductor manufacturing, particularly through his patented technology, demonstrate his commitment to enhancing the lithographic process. His work continues to influence the industry positively.