This inventor holds 1 USPTO granted patent. Top assignee: Yonsei University. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Innovations of Hui Il Jeon in Lithography
Introduction
Hui Il Jeon is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of lithography through his innovative research and development. His work focuses on advanced materials that enhance the lithography process, which is crucial in various technological applications.
Latest Patents
Hui Il Jeon holds a patent for a "Block copolymer for lithography and lithography method using the same." This inventive concept relates to a block copolymer capable of self-assembling and self-healing. The block copolymer includes a first block that is a repeating unit of polymerized siloxane and a second block that is a repeating unit of polymerized alkyl azobenzene acrylate. The alkyl chain consists of 1 to 10 carbon atoms, with the number of repeating units of polymerized siloxane being about 60 to 80, and the number of repeating units of polymerized alkyl azobenzene acrylate being about 15 to 25. This innovative block copolymer exhibits a cylindrical phase, which is essential for improving lithographic techniques.
Career Highlights
Hui Il Jeon is affiliated with Yonsei University, where he conducts research and teaches. His academic background and expertise in materials science have positioned him as a leading figure in the development of new lithographic materials. His contributions have been recognized within the academic community, and he continues to push the boundaries of innovation in this field.
Collaborations
Hui Il Jeon collaborates with esteemed colleagues, including Du Yeol Ryu and Seungbae Jeon. These partnerships enhance the research output and foster a collaborative environment that drives innovation in lithography.
Conclusion
Hui Il Jeon's work in developing advanced block copolymers for lithography represents a significant advancement in the field. His innovative approach and collaboration with other researchers contribute to the ongoing evolution of lithographic techniques. His contributions are vital for future technological advancements in various industries.