This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 1998-2002.
Location History:
- Hsin-Chu, TW (1998 - 1999)
- Hsin-Cui, TW (2002)
Company Filing History:
Years Active: 1998-2002
Title: Innovations of Hui-Hua Chang
Introduction
Hui-Hua Chang is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on improving processes and equipment used in the manufacturing of semiconductor devices.
Latest Patents
One of his latest patents is titled "Low pressure chemical vapor deposition with reduced particulate contamination." This invention involves several modifications to existing LPCVD equipment to minimize particulate contamination. A bypass vent has been added in parallel with the main vacuum exhaust gate valve, which remains open during the loading and unloading of wafers. This design ensures a continuous flow of air away from the wafers. Additionally, the vacuum line section adjacent to the reaction chamber is heated, enhancing the overall efficacy of the equipment and method.
Another significant patent is the "Method for fabricating fully dielectric isolated silicon (FDIS)." This invention outlines a process for creating fully dielectric isolated silicon by anodizing a buried doped silicon layer through trenches formed between active areas. The process includes oxidizing the porous silicon layer to create a buried oxide layer and depositing a dielectric in the trenches. This innovative method allows for the formation of isolated silicon regions, which are essential for advanced semiconductor applications.
Career Highlights
Hui-Hua Chang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work at this leading semiconductor manufacturer has allowed him to contribute to cutting-edge technologies in the industry. His inventions have the potential to enhance the efficiency and reliability of semiconductor manufacturing processes.
Collaborations
Hui-Hua Chang has collaborated with several talented individuals in his field, including Shih-Chi Lin and Hui-ju Yu. These collaborations have fostered innovation and have led to the development of advanced technologies in semiconductor manufacturing.
Conclusion
Hui-Hua Chang's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future advancements in semiconductor manufacturing.