Company Filing History:
Years Active: 1976-1980
Title: Innovations of Hugo Vital Van Goethem
Introduction
Hugo Vital Van Goethem is a notable inventor based in Edegem, Belgium. He has made significant contributions to the field of materials science, particularly in the development of radiation-sensitive materials. With a total of 2 patents to his name, Van Goethem's work has implications in various technological applications.
Latest Patents
One of his latest patents is focused on the production of etch-resist colloid and the material suitable for it. This patent describes a radiation-sensitive material that includes a hydrophilic colloid layer containing a dispersed phase of at least one radiation-sensitive polymer. The polymer chain comprises units with side substituents containing oxime ester groups. Upon imagewise exposure to actinic radiation, the polymer in the exposed areas reduces the permeability of the hydrophilic colloid layer for an etchant, eliminating the need for a washing away step. This innovation can be utilized to modify surfaces for applications such as printed circuits or printing forms. Another patent involves complexing residual photosensitive polyhalogen compounds with a recording process that includes image stabilization.
Career Highlights
Hugo Vital Van Goethem is associated with Agfa Gevaert NV, a company known for its advancements in imaging technology and materials. His work at Agfa Gevaert has allowed him to explore innovative solutions in the field of etch-resist materials.
Collaborations
Throughout his career, Van Goethem has collaborated with notable colleagues, including Marcel Stroobants and Walter F De Winter. These collaborations have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Hugo Vital Van Goethem's contributions to the field of materials science, particularly through his patents, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future developments.