Agfa Gevaert Nv

Hugo Vital Van Goethem

Walter F De Winter

Albert Lucien Poot

Edwin Hendrik Hazenbosch

Marcel Stroobants

A radiation-sensitive material is described that comprises a hydrophilic colloid layer containing a dispersed phase of at least one radiation sensitive polymer the polymer chain of which comprises units with side substituents containing oxime ester groups. Upon imagewise exposure to actinic radiation the polymer in the exposed areas reduces the permeability of the hydrophilic colloid layer for an etchant in the absence of any ethylenically unsaturated monomer. The layer having upon image-wise exposure to radiation image-wise differentiations in permeability for an etchant can be used as etch-resist, without needing a washing away step, to modify image-wise the surface of an element e.g. to produce printed circuits or printing forms.

Production of etch-resist colloid and material suitable therefor

A recording process including image stabilization comprising the steps of:

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Edegem, Belgium

Hugo Vital Van Goethem