The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 1980
Filed:
May. 30, 1978
Hugo V Van Goethem, Edegem, BE;
Marcel Stroobants, Muizen, BE;
Walter F De Winter, S-Gravenwezel, BE;
AGFA-GEVAERT N.V., Mortsel, BE;
Abstract
A radiation-sensitive material is described that comprises a hydrophilic colloid layer containing a dispersed phase of at least one radiation sensitive polymer the polymer chain of which comprises units with side substituents containing oxime ester groups. Upon imagewise exposure to actinic radiation the polymer in the exposed areas reduces the permeability of the hydrophilic colloid layer for an etchant in the absence of any ethylenically unsaturated monomer. The layer having upon image-wise exposure to radiation image-wise differentiations in permeability for an etchant can be used as etch-resist, without needing a washing away step, to modify image-wise the surface of an element e.g. to produce printed circuits or printing forms.