Hugo Rivera

Title: Innovations by Hugo Rivera in Plasma Technology

Introduction

Hugo Rivera is an accomplished inventor based in Santa Clara, CA. He has made significant contributions to the field of plasma technology, particularly through his innovative methods of manufacturing plasma generating cells. His work is vital for advancements in various applications that utilize plasma sources.

Latest Patents

Hugo Rivera holds a patent for "Methods of manufacturing plasma generating cells for a plasma source." This patent describes a method of manufacturing a dielectric barrier discharge (DBD) structure. The process includes forming a patterned electrode layer around the outer perimeter of a substrate composed of a dielectric material. The patterned electrode layer features multiple electrodes with gaps between adjacent electrodes. Additionally, the method involves depositing a dielectric layer over at least a first region of the patterned electrode layer to create a DBD region of the DBD structure. This innovation is crucial for enhancing the efficiency and effectiveness of plasma sources.

Career Highlights

Hugo Rivera is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His role at the company allows him to apply his expertise in plasma technology to develop cutting-edge solutions. Rivera's work has positioned him as a key figure in the advancement of manufacturing processes related to plasma applications.

Collaborations

Hugo Rivera collaborates with various professionals in his field, including his coworker Jian Wu. Their combined efforts contribute to the ongoing research and development of innovative technologies in plasma generation.

Conclusion

Hugo Rivera's contributions to plasma technology through his patent and work at Applied Materials, Inc. highlight his role as an influential inventor. His innovative methods are paving the way for future advancements in the industry.