Huei-Ping Hsieh

Title: Innovations of Huei-Ping Hsieh in IC Capacitor Technology

Introduction

Huei-Ping Hsieh is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of integrated circuit (IC) technology, particularly in the development of methods for making IC capacitors. His innovative approach has led to advancements that enhance the performance and efficiency of electronic devices.

Latest Patents

Huei-Ping Hsieh holds a patent for a "Method of making IC capacitor." This invention involves a detailed process that includes providing a substrate, forming a polycide layer, and creating an insulating amorphous silicon layer that serves as an anti-reflection layer. The method further includes implanting n-type ions into the insulating amorphous silicon layer to convert it into a conductive layer. This process culminates in the formation of a bottom electrode, dielectric layer, and top electrode, which are essential components of modern IC capacitors. He has 1 patent to his name.

Career Highlights

Huei-Ping Hsieh is associated with Mosel Vitelic Corporation, where he has been instrumental in driving innovation in semiconductor technology. His work has not only contributed to the company's success but has also positioned him as a key figure in the industry.

Collaborations

Huei-Ping Hsieh has collaborated with talented individuals such as Chun-Pey Cho and Tsai-Sen Lin. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Huei-Ping Hsieh's contributions to the field of IC capacitors exemplify the impact of innovative thinking in technology. His patent and work at Mosel Vitelic Corporation highlight his role as a significant inventor in the semiconductor industry.