This inventor holds 1 USPTO granted patent. Top assignee: Nanchang University. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Innovations of Huang Weng in Plasma Measurement
Introduction
Huang Weng is a notable inventor based in Nanchang, China. He has made significant contributions to the field of plasma measurement through his innovative methods. His work focuses on the nonextensive parameters of plasma, which are crucial for various applications in physics and engineering.
Latest Patents
Huang Weng holds a patent titled "Method for measuring plasma ion nonextensive parameter." This invention relates to a method for measuring the ion nonextensive parameter of plasma. The process involves describing the plasma using nonextensive statistical mechanics and obtaining an equation that relates the geodesic acoustic mode frequency to the ion acoustic speed of plasma. The method includes collecting measurement data of the geodesic acoustic mode frequencies and plasma temperature, which are then used to derive the ion nonextensive parameter numerically. This invention addresses a gap in the ability to diagnose ion nonextensive parameters, complementing existing methods for electron nonextensive parameters.
Career Highlights
Huang Weng is affiliated with Nanchang University, where he continues to advance research in plasma physics. His work has garnered attention for its innovative approach and practical applications in the field. With a total of 1 patent, he has established himself as a key figure in his area of expertise.
Collaborations
Huang Weng has collaborated with notable colleagues, including Huibin Qiu and Zuozhi Hu. Their joint efforts contribute to the advancement of research in plasma measurement and related fields.
Conclusion
Huang Weng's contributions to the measurement of plasma ion nonextensive parameters highlight his innovative spirit and dedication to advancing scientific knowledge. His work not only fills existing gaps in the field but also paves the way for future research and applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile