Hsinchu, Taiwan

Huang Wei Lin


Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2019-2020

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2 patents (USPTO):Explore Patents

Title: The Innovations of Huang Wei Lin: Advancements in Polycrystalline Silicon Technology

Introduction

Huang Wei Lin is a notable inventor based in Hsinchu, Taiwan. With a focus on advancements within the semiconductor industry, he has made significant contributions to the field through his inventive spirit and expertise. As of now, he holds a total of two patents, which showcase his dedication to innovation.

Latest Patents

Huang Wei Lin's latest patents include groundbreaking inventions in polycrystalline silicon technology. His first patent describes a polycrystalline silicon wafer characterized by a number of unique features. Notably, this wafer comprises a multitude of silicon grains, with carbon content exceeding 4 ppma and a resistivity of at least 1.55 Ω-cm. This innovation aims to enhance the efficiency and performance of silicon wafers used in electronic applications.

In his second patent, Huang presents a polycrystalline silicon column. This column is similarly defined by its multiple silicon grains that grow along a crystal-growing direction. The patent reveals that the average grain size of these silicon grains exhibits an inverse relationship with their resistivity and oxygen content, while demonstrating a direct correlation with the defect area ratio. Remarkably, the overall average defect area ratio of the polycrystalline silicon column is maintained at or below 2.5%, signifying a high-quality product.

Career Highlights

Huang Wei Lin is currently employed at Sino-American Silicon Products Inc., where he applies his expertise to innovate and advance silicon products. His work has positioned him as a key figure in the development of cutting-edge silicon technology, contributing to the growing field of semiconductors.

Collaborations

Throughout his career, Huang has collaborated with notable colleagues, including Cheng-Jui Yang and Yu-Min Yang. These collaborations have fostered a productive environment that encourages the exchange of ideas and the development of new technologies, ultimately leading to successful patent applications and innovations.

Conclusion

Huang Wei Lin's contributions to the field of polycrystalline silicon technology highlight his inventive prowess and collaborative spirit. With two patents that demonstrate innovative solutions to existing challenges in the semiconductor industry, Huang continues to impact the world of technology in meaningful ways. His work at Sino-American Silicon Products Inc. exemplifies his commitment to excellence and progress within this critical sector.

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