Company Filing History:
Years Active: 2000-2006
Title: Huan-Wen Wang: Innovator in Semiconductor Technology
Introduction
Huan-Wen Wang is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of bipolar transistors. With a total of 7 patents to his name, Wang's work has had a substantial impact on the industry.
Latest Patents
One of Wang's latest patents is titled "Amorphizing ion implant method for forming polysilicon emitter bipolar transistor." This innovative method involves a pair of ion implant techniques. The first technique implants a portion of an intrinsic base region, which is situated between an extrinsic base region and a polysilicon emitter layer, with an amorphizing non-active dopant. The second technique implants the polysilicon emitter layer with an active dopant, resulting in a doped polysilicon emitter layer. This method enhances the performance of the polysilicon emitter bipolar transistor, showcasing Wang's expertise in semiconductor fabrication.
Career Highlights
Huan-Wen Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the performance and efficiency of various semiconductor devices.
Collaborations
Wang has collaborated with notable colleagues, including Sen-Fu Chen and Chih-Heng Shen. These partnerships have fostered innovation and contributed to the successful development of new technologies in the semiconductor field.
Conclusion
Huan-Wen Wang's contributions to semiconductor technology, particularly through his innovative patents, have established him as a key figure in the industry. His work continues to influence the development of advanced electronic devices, making a lasting impact on technology.