Company Filing History:
Years Active: 2006-2009
Title: Hsun-Chang Chan: Innovator in Semiconductor Technology
Introduction
Hsun-Chang Chan is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to integrated circuit design.
Latest Patents
Hsun-Chang Chan's latest patents include advancements in semiconductor devices and methods for reducing defects in post passivation interconnect processes. The first patent, titled "Semiconductor devices having post passivation interconnections and a buffer layer," discloses an integrated circuit featuring a passivation layer made of a non-oxide material. This design includes a buffer layer, preferably a silicon oxide layer, which is thinner than the passivation layer. A post passivation metal layer is then deposited, allowing for a second plurality of contact pads in a new connection pattern.
The second patent, "Method for reducing defects in post passivation interconnect process," outlines a method for forming post passivation interconnects. Similar to the first patent, it involves a passivation layer of a non-oxide material and a silicon oxide buffer layer. This innovative approach aims to enhance the reliability and performance of integrated circuits.
Career Highlights
Hsun-Chang Chan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on improving integrated circuit designs and processes, contributing to the advancement of semiconductor technology.
Collaborations
Hsun-Chang Chan has collaborated with notable colleagues, including Hsi-Kuei Cheng and Hung-Ju Chien. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the semiconductor field.
Conclusion
Hsun-Chang Chan's contributions to semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor. His innovative approaches continue to shape the future of integrated circuit design and manufacturing.