Hsinchu, Taiwan

Hsuen-Li Chen

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.4

ph-index = 1


Company Filing History:


Years Active: 2021-2023

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2 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Hsuen-Li Chen in Heat Dissipation and Raman Scattering Technology**

Introduction

Hsuen-Li Chen, an accomplished inventor based in Hsinchu, Taiwan, has made significant strides in the fields of heat dissipation technology and surface enhanced Raman scattering. With a total of two patents to his name, Chen's inventions reflect a deep understanding of materials and their applications in enhancing performance and efficiency.

Latest Patents

Chen’s most recent innovations include a composite heat dissipation device and a surface enhanced Raman scattering device.

The **composite heat dissipation device and preparation method and applications thereof** involves an electromagnetic radiation dissipation pile comprising a polar dielectric material assembly. This assembly features multiple polar dielectric material units that are designed to interact with solar radiation. By scattering light, these units enhance the device's ability to manage thermal radiation through the usage of optical phonons.

His other patent, the **surface enhanced Raman scattering device and method of manufacturing the same**, includes a substrate that has a distinct surface energy. A modulation layer formed on this substrate presents a lower surface energy, which is essential for the effective performance of the surface enhanced Raman scattering structure. This innovation lays an important foundation for advancements in molecular detection and analysis.

Career Highlights

Hsuen-Li Chen is affiliated with Tsinghua University, where he has been able to foster groundbreaking research and innovation. His academic and professional journey has positioned him as a notable figure in the realms of engineering and applied physics, contributing valuable insights into material science.

Collaborations

In his endeavors, Chen collaborates with esteemed colleagues, including De-hui Wan and Sih-Wei Chang. Their collective expertise promotes a robust research environment that nurtures innovation and leads to impactful technological advancements.

Conclusion

Hsuen-Li Chen’s contributions to the fields of heat dissipation and surface enhanced Raman scattering represent not just individual achievements but also a collaborative effort that pushes the boundaries of material science. With the continued pursuit of innovative solutions, his work will undoubtedly foster further advancements in technology.

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