Hsu-Cheng Huang

Title: An Insight into Inventor Hsu-Cheng Huang

Introduction

Hsu-Cheng Huang, based in Fremont, California, is a prominent inventor known for his significant contributions to the field of semiconductor processing. His innovative work has led to the development of crucial technologies that enhance the efficiency of manufacturing processes in the industry.

Latest Patents

Huang holds one patent titled "Method for generating vertical profiles in organic layer etches." This patent details a method for etching an organic carbon-based layer below a silicon-containing hardmask. The innovative technique utilizes an etch gas comprised of oxygen and a halogen containing component, along with a passivation component. The patent outlines a specific ratio by volume of the total flow rate of the etch gas to the flow rate of the halogen-containing component, ranging from 10,000:1 to 10:1. This process is further refined by forming the etch gas into a plasma that selectively etches the organic carbon-based layer while preserving the silicon-containing hardmask, showcasing Huang's expertise in advanced material processing.

Career Highlights

Hsu-Cheng Huang is affiliated with Lam Research Corporation, a leading company in the semiconductor equipment industry. His career at Lam Research has allowed him to explore and develop innovations that help push the boundaries of technology in microelectronics.

Collaborations

Throughout his career, Huang has worked alongside talented colleagues, including Sriharsha Jayanti and Sangjun Cho. These collaborations have fostered an environment of innovation and knowledge exchange, resulting in advancements in the semiconductor manufacturing process.

Conclusion

Hsu-Cheng Huang's contributions to patentable technologies exemplify the importance of innovation in the semiconductor industry. His work not only demonstrates his abilities as an inventor but also plays a vital role in the evolution of manufacturing techniques that significantly impact the future of electronics.