Pingzhen, Taiwan

Hsiu-Lun Yeh

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Inpaq Technology Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hsiu-Lun Yeh. Retrieved from https://idiyas.com/inventor/hsiu-lun-yeh-nn5bezyb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Hsiu-Lun Yeh: Innovator in Semiconductor Packaging

Introduction

Hsiu-Lun Yeh is a notable inventor based in Pingzhen, Taiwan. He has made significant contributions to the field of semiconductor packaging, showcasing his expertise through innovative methods and techniques.

Latest Patents

Hsiu-Lun Yeh holds a patent for a "Method for preparing a semiconductor package." This patent outlines a process for creating a semiconductor package that meets standard size requirements, even when starting from a die that is smaller than the standard size. The method involves several steps, including providing a wafer, forming a die, dicing the die, encapsulating it, and finally singulating the encapsulated die to achieve a size equal to or larger than the standard size 0201.

Career Highlights

Hsiu-Lun Yeh is associated with Inpaq Technology Co., Ltd., where he applies his knowledge and skills in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor packaging, which is crucial for modern electronic devices.

Collaborations

Hsiu-Lun Yeh collaborates with talented individuals in his field, including Yu-Ming Peng and Chu-Chun Hsu. These collaborations enhance the innovation process and contribute to the development of cutting-edge technologies.

Conclusion

Hsiu-Lun Yeh's contributions to semiconductor packaging through his innovative patent demonstrate his commitment to advancing technology in this critical area. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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