Company Filing History:
Years Active: 1999-2002
Title: Innovations of Hsiu-Lan Lee
Introduction
Hsiu-Lan Lee is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to solving complex problems in the industry.
Latest Patents
One of Hsiu-Lan Lee's latest patents is a method for removing etch-induced polymer film and damaged silicon layer from a silicon surface. This invention discloses a method for simultaneously removing polymeric films and damaged silicon layers by exposing the surface to a cleaning solution containing amine or ethanolamine. The method is effective in cleaning away damaged silicon layers with a thickness between about 20 Å and about 60 Å in a time frame of approximately 2 to 20 minutes. A preferred embodiment of this method utilizes a water solution of ethanolamine and gallic acid.
Another significant patent by Hsiu-Lan Lee is a method for removing fluorinated photoresist layers from semiconductor substrates. This method involves forming a metal contact layer over a semiconductor substrate, followed by a silicon-containing dielectric layer. A patterned photoresist layer is then created, and a reactive ion etch (RIE) plasma etch method is employed to form a via through the dielectric layer. The method effectively removes the patterned fluorinated surface layer of the photoresist while ensuring that the metal-polymer residue layer remains intact during the process.
Career Highlights
Hsiu-Lan Lee is currently employed at Vanguard International Semiconductor Corporation, where he continues to develop innovative solutions in semiconductor technology. His work has significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Hsiu-Lan Lee collaborates with talented individuals in his field, including Tzu-Shih Yen and Rong-Wu Chien. These collaborations enhance the innovative capacity of their projects and contribute to advancements in semiconductor technology.
Conclusion
Hsiu-Lan Lee's contributions to the semiconductor industry through his patents and collaborative efforts highlight his role as a key innovator. His work continues to influence the field, paving the way for future advancements in technology.