The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2002
Filed:
Jun. 04, 1998
Applicant:
Inventors:
Assignee:
Vanguard International Semiconductor Corporation, Hsin Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ; C11D 7/704 ;
U.S. Cl.
CPC ...
H01L 2/1302 ; C11D 7/704 ;
Abstract
The present invention discloses a method for simultaneously removing from a silicon surface polymeric films and damaged silicon layers by exposing the surface to a cleaning solution that contains amine or ethanolamine for a length of time that is sufficient to remove all such unwanted materials. The method is effective in cleaning away damaged silicon layers having a thickness between about 20 Å and about 60 Å in a period of time between about 2 minutes and about 20 minutes. In a preferred embodiment, the cleaning solution is a water solution of ethanolamine and gallic acid.