This inventor holds 1 USPTO granted patent. Top assignee: Grand Process Technology Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Hsiu-Kai Chang: Wafer Processing Inventor.
Introduction
Hsiu-Kai Chang is an inventor based in Hsinchu City, Taiwan. His work includes a patented method for wafer processing, and he is associated with Grand Process Technology Corporation.
Latest Patents
Chang’s listed patent is “Wafer processing method.” It describes a process using a multifunctional single-wafer immersion and spin-cleaning device equipped with a spin drive, wafer turntable, and wafer receiving tray. A soaking tank and watertight contact gasket help retain liquid medicine at a level sufficient to immerse the wafer. The method also includes device preparation, lifting, wafer placement, soaking, and spin cleaning. Chang is credited with 1 patent.
Career Highlights
Chang’s patent focuses on combining immersion and spin cleaning in wafer processing. The described gasket and soaking tank are intended to support thorough liquid treatment while the wafer is held in the device.
Collaborations
Chang’s listed coworkers include Li-Tso Huang and Chin-Yuan Wu. His company affiliation is Grand Process Technology Corporation.
Conclusion
Hsiu-Kai Chang’s patent documents an approach to wafer processing that integrates soaking and spin cleaning in a single-wafer device.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile