Hsiu-kai Chang

Title: Hsiu-kai Chang: Innovator in Wafer Processing Technology

Introduction

Hsiu-kai Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of wafer processing technology, holding a total of 2 patents. His innovative designs focus on enhancing the efficiency and effectiveness of wafer cleaning and processing methods.

Latest Patents

Chang's latest patents include a "Single wafer spin cleaning apparatus with soaking, cleaning, and etching functions." This invention features a spin driver device, a wafer spin chuck, and a wafer support disk. The apparatus allows for efficient cleaning and etching processes by soaking the wafer in a processing liquid. Another significant patent is the "Multifunctional single wafer soaking-spinning-cleaning device and wafer processing method." This invention outlines a comprehensive method that includes multiple steps for wafer processing, utilizing a multifunctional device designed for immersion and spin cleaning.

Career Highlights

Throughout his career, Hsiu-kai Chang has worked with companies such as Grand Process Technology Corporation and Grand Process Technology Corp. His experience in these organizations has contributed to his expertise in wafer processing technologies.

Collaborations

Chang has collaborated with notable colleagues, including Li-tso Huang and Chin-yuan Wu. Their combined efforts have further advanced the innovations in the field of wafer processing.

Conclusion

Hsiu-kai Chang's contributions to wafer processing technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the efficiency of wafer cleaning and processing methods.