Taichung, Taiwan

Hsiu-Jen Wang

USPTO Granted Patents = 7 

Average Co-Inventor Count = 5.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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7 patents (USPTO):Explore Patents

Title: Innovations of Hsiu-Jen Wang: Advancements in Digital Lithography

Introduction: Hsiu-Jen Wang, an accomplished inventor based in Taichung, Taiwan, has made significant contributions to the field of digital lithography. With a total of five patents to his name, Wang's innovative technologies have advanced the methods of substrate packaging and imaging systems, showcasing his expertise and dedication to enhancing semiconductor manufacturing processes.

Latest Patents: Among Wang's notable patents, his latest inventions include the "Advanced-packaging high-volume-mode digital-lithography-tool" and the "Dynamic imaging system." The advanced packaging tool introduces exemplary methods for aligning and transferring substrates to ensure precise measurements and optimal printing patterns. The dynamic imaging system addresses pattern defects resulting from substrate warpage, providing compensated exposure patterns through sophisticated 3D profile measurements and adjustments. These inventions illustrate Wang's commitment to solving complex challenges in lithography.

Career Highlights: Hsiu-Jen Wang has established a commendable career at Applied Materials, Inc., where he continues to innovate and lead projects aimed at improving semiconductor equipment. His work is pivotal in streamlining processes and enhancing the quality of outputs in chip manufacturing, making him a valued asset to the industry.

Collaborations: Throughout his career, Wang has collaborated with talented colleagues, including Shih-Hao Kuo and Ching-Chang Chen. These partnerships have fostered an environment of creativity and innovation, allowing for the successful development of cutting-edge technologies.

Conclusion: Hsiu-Jen Wang's contributions to digital lithography and substrate packaging are shaping the future of semiconductor manufacturing. His five patents reflect a deep understanding of the intricacies involved in lithography systems and an unwavering commitment to advancement. Wang continues to inspire and lead with his innovative spirit, promising an exciting trajectory for the industry.

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