Hsiu-Chuan Shu

Title: Hsiu-Chuan Shu: Innovator in Semiconductor Technology

Introduction

Hsiu-Chuan Shu is a notable inventor based in Jhubei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods in transistor fabrication. His work has implications for the advancement of electronic devices and their efficiency.

Latest Patents

Hsiu-Chuan Shu holds a patent for a "Method of fabricating a recess channel transistor." This method involves several steps, including the formation of a hard mask on a doped-semiconductor layer and a substrate. The process includes etching to create a trench, defining a source/drain in the doped-semiconductor layer, and performing an implantation process at a tilt angle on the trench's sidewalls. Additionally, a thermal oxidation process is executed to form an oxide layer with varying thicknesses on different portions of the trench's sidewalls. This innovative approach enhances the performance and reliability of transistors.

Career Highlights

Hsiu-Chuan Shu is associated with Promos Technologies, Inc., where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise and innovative mindset have positioned him as a valuable asset to the company.

Collaborations

Hsiu-Chuan Shu has worked alongside talented colleagues, including Jih-Wen Chou and Chih-hsun Chu. Their collaborative efforts contribute to the advancement of semiconductor technologies and foster a creative environment for innovation.

Conclusion

Hsiu-Chuan Shu's contributions to semiconductor technology through his patent for a recess channel transistor exemplify his innovative spirit and dedication to advancing the field. His work at Promos Technologies, Inc. and collaborations with esteemed colleagues further highlight his impact on the industry.