Oak Park, CA, United States of America

Hsiu-Che Wang

This inventor holds 1 USPTO granted patent. Top assignee: Marvell Asia Pte., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hsiu-Che Wang. Retrieved from https://idiyas.com/inventor/hsiu-che-wang-gvg0qecf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hsiu-Che Wang: Innovator in Electronic Device Fabrication

Introduction

Hsiu-Che Wang is a prominent inventor based in Oak Park, CA (US). She has made significant contributions to the field of electronic device fabrication. Her innovative approach has led to the development of a unique method that enhances the reliability of electronic components.

Latest Patents

Hsiu-Che Wang holds a patent for her invention titled "Warpage-resilient attachment of die to substrate in mass reflow soldering." This method involves applying an array of non-uniformly sized spots of solder material on a substrate. The average size of the spots is larger in the center portion of the array than in the peripheral portion. This innovative technique allows for a die to be soldered to the substrate using the array, improving the overall performance and durability of electronic devices. She has 1 patent to her name.

Career Highlights

Hsiu-Che Wang is currently employed at Marvell Asia Pte., Ltd., where she continues to push the boundaries of technology in electronic device fabrication. Her work has been instrumental in advancing the methods used in the industry.

Collaborations

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Conclusion

Hsiu-Che Wang's contributions to the field of electronic device fabrication exemplify her innovative spirit and dedication to advancing technology. Her patent showcases her ability to solve complex problems in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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