Hsinchu County, Taiwan

Hsing-Kan Peng

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2011-2014

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2 patents (USPTO):Explore Patents

Title: Hsing-Kan Peng: Innovator in Semiconductor Technology

Introduction

Hsing-Kan Peng is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods for patterning metal alloy materials and developing advanced semiconductor devices.

Latest Patents

One of Hsing-Kan Peng's latest patents is titled "Method of patterning metal alloy material layer having hafnium and molybdenum." This method involves forming a patterned mask layer on a metal alloy material layer that contains hafnium and molybdenum on a substrate. The patterned mask layer serves as a mask during an etching process, which utilizes an etchant composed of nitric acid, hydrofluoric acid, and sulfuric acid. This process results in the formation of a metal alloy layer with hafnium and molybdenum, after which the patterned mask layer is removed.

Another significant patent is for a "semiconductor device and method of manufacturing the same." This invention includes a metallic compound, HfMoN, which functions as an electrode. The work function of this electrode can be adjusted by doping the metallic compound with various dopants, such as nitrogen, silicon, or germanium. This innovation is applicable to PMOS, NMOS, CMOS transistors, and capacitors, showcasing its versatility in semiconductor applications.

Career Highlights

Hsing-Kan Peng is currently employed at Nan Ya Technology Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of electronic devices, making them more efficient and effective.

Collaborations

Throughout his career, Hsing-Kan Peng has collaborated with talented individuals such as Shian-Jyh Lin and Chih-Wei Huang. These collaborations have fostered an environment of innovation and creativity, leading to groundbreaking advancements in their field.

Conclusion

Hsing-Kan Peng's contributions to semiconductor technology through his patents and work at Nan Ya Technology Corporation highlight his role as a key innovator in the industry. His advancements in patterning methods and semiconductor devices are paving the way for future developments in electronics.

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