The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
May. 31, 2011
Chih-wei Huang, Taoyuan County, TW;
Chao-sung Lai, Taoyuan County, TW;
Hsing-kan Peng, Hsinchu County, TW;
Chung-yuan Lee, Taoyuan County, TW;
Shian-jyh Lin, Taipei County, TW;
Chih-Wei Huang, Taoyuan County, TW;
Chao-Sung Lai, Taoyuan County, TW;
Hsing-Kan Peng, Hsinchu County, TW;
Chung-Yuan Lee, Taoyuan County, TW;
Shian-Jyh Lin, Taipei County, TW;
Nanya Technology Corporation, Taoyuan, TW;
Abstract
A method of patterning a metal alloy material layer having hafnium and molybdenum. The method includes forming a patterned mask layer on a metal alloy material layer having hafnium and molybdenum on a substrate. The patterned mask layer is used as a mask and an etching process is performed using an etchant on the metal alloy material layer having hafnium and molybdenum so as to form a metal alloy layer having hafnium and molybdenum. The etchant includes at least nitric acid, hydrofluoric acid and sulfuric acid. The patterned mask layer is removed.