Hsing-Ju Lin

Title: Hsing-Ju Lin: Innovator in Transistor Technology

Introduction

Hsing-Ju Lin is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the design and manufacturing of transistor structures. His innovative work has led to the development of a unique patent that enhances the performance and efficiency of transistors.

Latest Patents

Hsing-Ju Lin holds a patent for a "Transistor structure and manufacturing method thereof." This invention includes a transistor structure that comprises a substrate, a gate structure, first pocket doped regions, second pocket doped regions, source/drain extension regions, and source/drain regions. The gate structure is positioned on the substrate, while the first pocket doped regions are located in the substrate adjacent to the gate structure. The dopant in the first pocket doped region consists of a group IVA element. The second pocket doped regions are also situated in the substrate next to the gate structure, with a greater depth than the first pocket doped regions. The source/drain extension regions are found within the first pocket doped regions, and the source/drain regions are located in the substrate beside the gate structure. The source/drain extension region is strategically placed between the source/drain region and the gate structure.

Career Highlights

Hsing-Ju Lin is currently employed at Macronix International Co., Ltd., a leading company in the semiconductor industry. His work at Macronix has allowed him to focus on advancing transistor technology and contributing to the company's innovative projects.

Collaborations

Throughout his career, Hsing-Ju Lin has collaborated with talented individuals such as Jeng Hwa Liao and Zong-Jie Ko. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Hsing-Ju Lin is a prominent inventor whose work in transistor technology has made a significant impact in the semiconductor field. His innovative patent and contributions to Macronix International Co., Ltd. highlight his dedication to advancing technology.