Company Filing History:
Years Active: 1987-2008
Title: Hsing-Chien Ma: Innovator in Semiconductor Photolithography
Introduction
Hsing-Chien Ma is a prominent inventor based in Fremont, CA (US). He has made significant contributions to the field of semiconductor photolithography, holding a total of 5 patents. His work focuses on enhancing the performance and efficiency of photomasks used in advanced lithography processes.
Latest Patents
One of his latest patents is titled "Dual-layer EUV mask absorber with trenches having opposing sidewalls that are straight and parallel." This invention addresses the structural and processing requirements of extreme ultraviolet (EUV) lithography. It combines a first mask absorber layer that is anisotropically etched with minimal etch bias at a relatively fast etch rate, with a highly-selective second mask absorber layer. This combination produces a mask absorber with desirable hybrid performance properties.
Another notable patent is "Mechanized retractable pellicles and methods of use." This invention provides apparatus and methods to protect a photomask used for semiconductor photolithography at wavelengths outside the visible spectrum. The pellicle can be readily retracted during exposure or to provide access to the photomask. It can be transparent at an inspection wavelength and opaque at an exposure wavelength. Various embodiments allow the pellicle to be slid, retracted, or pivoted relative to a base aligned with the photomask, thus uncovering it. The pellicle can be secured with magnetic elements, and some designs include a diaphragm with shutter leaves that can be opened or closed.
Career Highlights
Hsing-Chien Ma has worked with notable companies such as Intel Corporation and Hughes Aircraft Company. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.
Collaborations
Throughout his career, Hsing-Chien Ma has collaborated with talented individuals, including Arun Ramamoorthy and Pei-yang Yan. These collaborations have further enriched his work and contributions to the field.
Conclusion
Hsing-Chien Ma is a distinguished inventor whose work in semiconductor photolithography has led to significant advancements in the industry. His innovative patents and collaborations reflect his commitment to enhancing technology in this critical field.