Hsin-Yu Chang

**Title: Innovator Hsin-Yu Chang: Pioneering Substrate Fabrication Techniques**

Introduction

Hsin-Yu Chang, located in Tainan, Taiwan, is a notable inventor recognized for his contributions to the field of substrate fabrication. With a total of two patents to his name, Chang has made significant advancements that are not only innovative but also enhance manufacturing processes in various applications.

Latest Patents

Among his latest patents, Chang has developed a groundbreaking method for fabricating a substrate with a through via. This method involves several steps, including the provision of a carrier board with a release layer, attaching the substrate to the carrier board, and applying a light beam to create a blind hole that penetrates both surfaces of the substrate. Following this, an enlargement process is conducted to form a second blind hole, in which a through via is created. The final stage involves a de-bonding process to release the substrate from the carrier board.

Another notable patent is his innovative cutting method for forming chamfered corners on substrates. This method includes selecting a light pattern-adjusting module based on a predetermined chamfer angle, which employs a laser beam to form a modified region within the substrate. The axial energy distribution of the laser is adjusted to meet the required chamfer angle, and then the modified region is etched to produce a chamfered surface.

Career Highlights

Chang is currently associated with the Industrial Technology Research Institute, where he channels his expertise into developing cutting-edge technologies. His work significantly contributes to the advancement of reliable and efficient substrate fabrication methods that can be applied across various industries.

Collaborations

Chang collaborates closely with colleagues such as Yu-Chung Lin and Fu-Lung Chou, enhancing the innovative capacity and research output of their team. Their combined efforts are pivotal in pushing the boundaries of current technologies and exploring new frontiers in substrate applications.

Conclusion

Hsin-Yu Chang stands out as a significant figure in the realm of substrate technology. His innovative patents not only highlight his proficiency as an inventor but also serve to inspire further advancements within the industry. Through his work at the Industrial Technology Research Institute, Chang continues to play an essential role in shaping the future of substrate fabrication.