Company Filing History:
Years Active: 2016-2022
Title: Hsin-Lung Chao: Innovator in Semiconductor Technology
Introduction
Hsin-Lung Chao is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on innovative semiconductor arrangements and techniques that enhance the efficiency and functionality of semiconductor devices.
Latest Patents
One of Hsin-Lung Chao's latest patents involves a semiconductor arrangement with fin features having different heights. This patent outlines methods for forming semiconductor arrangements that include an etch sequence to create a first etched region over a planar region of a semiconductor arrangement. The first etched region exposes a planar structure, such as an alignment mark used during semiconductor fabrication. The etch sequence also forms a second etched region over a semiconductor fin region, which includes a first trench, a first fin nub, and a first pillar. A multi-depth STI structure is formed over at least one of these features, showcasing the innovative approaches Chao employs in his work.
Career Highlights
Hsin-Lung Chao is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading entity in the semiconductor industry. His expertise and innovative mindset have contributed to the advancement of semiconductor technologies, making him a valuable asset to his company and the industry as a whole.
Collaborations
Chao has collaborated with notable colleagues, including Tsung-Yu Chiang and Chen Chu-Hsuan. These collaborations have further enriched his work and have led to the development of cutting-edge semiconductor technologies.
Conclusion
Hsin-Lung Chao's contributions to semiconductor technology are noteworthy, and his innovative patents reflect his commitment to advancing the field. His work continues to influence the semiconductor industry, paving the way for future innovations.