Company Filing History:
Years Active: 2017-2019
Title: The Innovative Contributions of Hsin-Fu Teng
Introduction
Hsin-Fu Teng, an accomplished inventor based in Taipei, Taiwan, has made significant strides in the field of substrate processing. With two patents to his name, he continues to advance innovation in material cutting technologies. His contributions underscore the importance of creativity and research in improving industrial processes.
Latest Patents
Hsin-Fu Teng is credited with two notable patents. The first, titled "Apparatus for Cutting Substrate," reveals an innovative apparatus that includes a main body containing a reactive solution and a substrate. This invention features a catalytic cutting element that interacts with the substrate to effectively execute a chemical reaction for cutting.
The second patent, "Apparatus and Method for Processing a Substrate," details a processing method for substrates. This method involves the use of a die acting as a catalyst, which is placed on the substrate's surface. The substrate, along with the die, is immersed in a reaction solution, allowing a chemical reaction to occur, thereby enhancing the substrate's processing capabilities.
Career Highlights
Hsin-Fu Teng is affiliated with the National Taiwan University of Science and Technology, where he applies his expertise to research and development in substrate technologies. His role at this prestigious institution allows him to contribute to the academic and practical aspects of engineering innovations.
Collaborations
Throughout his career, Hsin-Fu Teng has collaborated with notable coworkers, including Bing-joe Hwang and Wei-nien Su. These partnerships have fostered a creative environment that enhances innovation and leads to the development of advanced technologies.
Conclusion
Hsin-Fu Teng stands out as a prominent inventor in the field of substrate processing. His patents highlight his pioneering efforts and underline the significance of chemical interactions in material cutting. With his dedication to innovation at the National Taiwan University of Science and Technology, he continues to inspire future advancements in technology.