The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 2017

Filed:

Feb. 03, 2016
Applicant:

National Taiwan University of Science and Technology, Taipei, TW;

Inventors:

Bing-Joe Hwang, Taipei, TW;

Wei-Nien Su, Taipei, TW;

Jeng-Ywan Jeng, Taipei, TW;

Yuan-Han Chu, Taipei, TW;

Tse-Ming Chiu, Taipei, TW;

Hsin-Fu Teng, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 21/78 (2006.01); B28D 5/04 (2006.01); H01L 21/3063 (2006.01);
U.S. Cl.
CPC ...
H01L 21/78 (2013.01); B28D 5/04 (2013.01); H01L 21/3063 (2013.01); H01L 21/30604 (2013.01);
Abstract

A method of processing a substrate is disclosed. The method includes the following steps: providing a substrate body having a surface; placing a die on the surface, wherein the die acts as a catalyst; immersing the substrate body and the die in a reaction solution; and processing the substrate body via a chemical reaction occurring on the surface through the reaction solution and the catalyst.


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