Hsieh Yue Ho

Title: Hsieh Yue Ho: Innovator in Semiconductor Technology

Introduction

Hsieh Yue Ho is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to manufacturing processes.

Latest Patents

Hsieh's latest patents include a method for wet etching of high k thin film at low temperature. This invention discloses an electrode structure of a light-emitting diode (LED) and the manufacturing method of the electrodes. After forming a pn junction of an LED on a substrate, a layer of SiO2 is deposited on the periphery of the die near the scribe line of the wafer. A transparent conductive layer is then deposited blanketly, followed by the formation of a layer of gold or AuGe with an opening at the center of the die. After heat treatment to form ohmic contact, a strip of aluminum is formed on one side of the die for wire bonding and to serve as the positive electrode of the LED. The negative electrode is formed on the substrate by metal contact. Another form of the electrode structure involves making both the positive and negative electrodes on the front side of the LED by etching the p-type semiconductor of the pn junction and forming a strip of negative electrode on the n-type semiconductor, with the positive electrode formed on the p-type semiconductor.

His second patent is a puddle etching method of thin film using a spin-processor. This invention describes a process where the wafer is pre-wet with deionized water and etch solution to remove contamination and the upper layer of the film. The wafer is then spun slowly while injecting etching solution to form a puddle that remains on the wafer. The etching process continues as the wafer spins slowly, followed by a rinse with deionized water and the use of isopropyl alcohol to remove the water through the Marangoni effect. Finally, the speed is increased to dry the wafer.

Career Highlights

Hsieh has worked with Grand Plastic Technology Corporation, where he has applied his expertise in semiconductor manufacturing. His work has contributed to advancements in the industry, particularly in the development of efficient etching methods.

Collaborations

Hsieh has collaborated with notable coworkers such as Kang Tsung-Kuei and Chih-Cheng Wang, further enhancing