Taibao, Taiwan

Hsiao Shih-Yi

This inventor holds 2 USPTO granted patents. Top assignees: Grand Plastic Technology Corporation, Grand Plastic Technology Corporation Taiwan. Active years: 2004-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hsiao Shih-Yi. Retrieved from https://idiyas.com/inventor/hsiao-shih-yi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 5.7

ph-index = 2

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2004-2006

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2 patents (USPTO):Explore Patents

Title: Hsiao Shih-Yi: Innovator in Semiconductor Technology

Introduction

Hsiao Shih-Yi is a notable inventor based in Taibau, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to manufacturing processes.

Latest Patents

One of his latest patents is titled "Method for wet etching of high k thin film at low temperature." This invention discloses an electrode structure of a light-emitting diode (LED) and the manufacturing method of the electrodes. The process involves forming a pn junction of an LED on a substrate, depositing a layer of SiO2 on the periphery of the die near the scribe line of the wafer, and then applying a transparent conductive layer. Following this, a layer of gold or AuGe is formed with an opening at the center of the die. The invention also details the formation of ohmic contact through heat treatment and the creation of both positive and negative electrodes on the front side of the LED.

Another significant patent by Hsiao is the "Puddle etching method of thin film by using spin-processor." This method involves pre-wetting the wafer with deionized water and etching solution to remove contamination. The wafer is then spun slowly while injecting the etching solution to create a puddle that remains on the wafer, allowing for effective etching. After the etching process, the wafer is rinsed and dried using a specific sequence of spinning and chemical treatments.

Career Highlights

Hsiao Shih-Yi has worked with Grand Plastic Technology Corporation, where he has applied his expertise in semiconductor manufacturing. His work has contributed to advancements in the production of electronic components.

Collaborations

Hsiao has collaborated with notable coworkers such as Kang Tsung-Kuei and Hsieh Yue Ho, further enhancing his contributions to the field.

Conclusion

Hsiao Shih-Yi's innovative patents and career in semiconductor technology highlight his role as a significant inventor in the industry. His work continues to influence advancements in LED manufacturing and etching processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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