This inventor holds 1 USPTO granted patent. Top assignee: Nan Ya Plastics Corporation. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: Hsiao-Loung Lu: Innovator in Photosensitive Ink Composition
Introduction
Hsiao-Loung Lu is a prominent inventor based in Taiwan, known for his contributions to the field of photosensitive materials. His innovative work has led to the development of a novel photosensitive resistive ink composition, which has significant applications in various industries.
Latest Patents
Hsiao-Loung Lu holds a patent for a photosensitive ink composition. This composition includes a photo curable prepolymer, a photocurable monomer, a photo-initiator, organic solvents, an epoxy compound, a curing agent, and a clay nano-composite. The resulting composition is designed to produce a solder mask film with excellent properties such as adhesiveness, chemical resistance, heat resistance, and high resolution.
Career Highlights
Lu is associated with Nan Ya Plastics Corporation, where he has been instrumental in advancing the company's research and development efforts. His work has not only enhanced the company's product offerings but has also contributed to the broader field of materials science.
Collaborations
Hsiao-Loung Lu has collaborated with notable colleagues, including Chun-Che Tsao and Cheng-Li Chao. These collaborations have fostered innovation and have been pivotal in the successful development of new technologies.
Conclusion
Hsiao-Loung Lu's contributions to the field of photosensitive materials exemplify the impact of innovative thinking in technology. His work continues to influence advancements in the industry, showcasing the importance of research and collaboration in driving progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile