Hsinchu, Taiwan

Hsiao-Ling Chiang


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018-2022

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Hsiao-Ling Chiang: Innovator in Semiconductor Technology

Introduction

Hsiao-Ling Chiang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of three patents. His work focuses on high-voltage semiconductor devices and innovative semiconductor structures.

Latest Patents

One of Hsiao-Ling Chiang's latest patents is a high-voltage semiconductor device. This device includes a substrate, a body region, a well region, a bulk region, a source, a drain, an isolation region, a gate structure, and a resistor. The design ensures that the body region and the well region are disposed in the substrate, while the bulk region and the source are located in the body region. The drain is positioned in the well region, and the isolation region is strategically placed on the well region, separating the drain from the source. The gate structure extends onto a portion of the isolation region, and the resistor is electrically connected to the bulk region and the drain, or the resistor is connected to the drain and/or the source.

Another notable patent is a semiconductor structure that includes a substrate, a first well, a field oxide layer, a first conductive line, and a second conductive line. The substrate has a first conductivity type, while the first well, formed on the substrate, has a second conductivity type. The field oxide layer is disposed on the first well, and both the first and second conductive lines are formed on the field oxide layer, ensuring they are in direct contact with it. The first conductive line is spaced apart from the second conductive line, enhancing the device's functionality.

Career Highlights

Hsiao-Ling Chiang is currently employed at Vanguard International Semiconductor Corporation, where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a key figure in the industry.

Collaborations

Hsiao-Ling Chiang has collaborated with notable colleagues, including Shin-Cheng Lin and Cheng-Tsung Wu. Their teamwork has fostered advancements in semiconductor research and development.

Conclusion

Hsiao-Ling Chiang's work in semiconductor technology exemplifies innovation and dedication. His patents reflect a commitment to advancing the field, and his collaborations further enhance the impact of his contributions.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…