Hsiao-Feng Lu

Title: Hsiao-Feng Lu: Innovator in Semiconductor Technology

Introduction

Hsiao-Feng Lu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 4 patents. His work focuses on advanced technologies that enhance the efficiency and effectiveness of semiconductor production processes.

Latest Patents

Among his latest patents is a physical vapor deposition (PVD) system and method of processing target. This innovative PVD system includes a chamber that defines a volume where target material is deposited onto a wafer. The design features a target that overlies the wafer, with specific surface roughness characteristics that optimize the deposition process. Another notable patent is a showerhead assembly and method for servicing the assembly in semiconductor manufacturing. This method involves an adjustable distributor assembly that allows for selective openings through which cleaning materials pass, ensuring the maintenance of optimal conditions during the manufacturing process.

Career Highlights

Hsiao-Feng Lu has worked with leading companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and the Industrial Technology Research Institute. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in semiconductor technology.

Collaborations

Throughout his career, Lu has collaborated with notable colleagues such as Po-Wei Wang and Chao-Hsing Lai. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Hsiao-Feng Lu's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of semiconductor manufacturing.