Hsiao-Fen Cheng

Title: Hsiao-Fen Cheng: Innovator in Environmental Cleaning Technologies

Introduction

Hsiao-Fen Cheng is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of environmental cleaning technologies, holding 2 patents that focus on innovative methods for purifying materials and water.

Latest Patents

One of his latest patents is titled "Method for removing impurities from porous materials." This invention discloses a technique for cleaning porous materials by utilizing a supercritical fluid, which can flow with or without a modifier. The process involves applying suitable temperatures and pressures to allow the supercritical fluid to penetrate the nanometer-level pores of the material, effectively removing trapped impurities. This method is environmentally friendly, conserving water and avoiding the use of acidic or alkaline solvents.

Another significant patent is "Process for removing organics from ultrapure water." This invention aims to reduce total organic carbon (TOC) in ultrapure water to below 1 ppb. The process involves several cycles of ozone contact and UV irradiation treatments, with the first cycle including an ion exchange treatment to enhance the purification process.

Career Highlights

Hsiao-Fen Cheng is affiliated with the Industrial Technology Research Institute, where he continues to develop innovative solutions for environmental challenges. His work is characterized by a commitment to sustainability and efficiency in cleaning technologies.

Collaborations

He collaborates with esteemed colleagues, including Kon-Tsu Kin and Pei-Lin Chang, to advance research and development in his field.

Conclusion

Hsiao-Fen Cheng's contributions to environmental cleaning technologies through his innovative patents demonstrate his dedication to creating efficient and sustainable solutions. His work not only addresses current environmental challenges but also paves the way for future advancements in the field.