The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2006
Filed:
Dec. 29, 2004
Kon-tsu Kin, Hsinchu, TW;
Chiou-mei Chen, Hsinchu, TW;
Pei-lin Chang, Hsinchu, TW;
Hsiao-fen Cheng, Hsinchu, TW;
Kon-Tsu Kin, Hsinchu, TW;
Chiou-Mei Chen, Hsinchu, TW;
Pei-Lin Chang, Hsinchu, TW;
Hsiao-Fen Cheng, Hsinchu, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
The present invention discloses a method for removing impurities from a porous material by flowing a supercritical fluid with or without a modifier therein over a to-be-cleaned porous material having pores at the nanometer level under suitable temperatures and pressures, so that the supercritical fluid migrates into the pores at the nanometer level and removes impurities entrapped therein. The method of the present invention uses the physical and chemical properties of the supercritical fluid and optionally the modifier to clean the porous material without using an acid or alkaline solvent. The method of the present invention conserves water, and is both a highly efficient and environmentally friendly cleaning technique.