Hsiao Chien-Wen

Title: Innovator Hsiao Chien-Wen: Pioneering Photoresist Removal Techniques

Introduction

Hsiao Chien-Wen, an accomplished inventor based in Hsinchu, Taiwan, has contributed significantly to the field of semiconductor technology. With a total of three patents to his name, Hsiao is recognized for his innovative approaches that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among Hsiao's notable inventions is a patent focused on photoresist removal. This patent outlines systems and techniques designed to remove photoresist from semiconductor wafers, which are crucial in the process of patterning and material deposition. The innovation steps in to ensure that the removal process does not damage the semiconductor wafer or any structures formed upon it. One key aspect of the invention involves the use of trioxygen liquid, which is activated by an activator—either ultraviolet light or hydrogen peroxide. This activation generates free radicals, facilitating the removal of photoresist. The method also includes an initial strip using a sulfuric acid and hydrogen peroxide mixture to remove a portion of the photoresist, followed by the application of activated trioxygen liquid to ensure a thorough clean.

Career Highlights

Hsiao Chien-Wen currently works at Taiwan Semiconductor Manufacturing Company Ltd. (TSMC), a global leader in semiconductor manufacturing. His work at TSMC has allowed him to collaborate with some of the brightest minds in the industry, contributing to advancements that push the boundaries of technology.

Collaborations

Throughout his career, Hsiao has teamed up with skilled colleagues like Shang-Yuan Yu and Shao-Yen Ku. Together, they have fostered an environment of collaboration, leading to innovative solutions that benefit the semiconductor sector.

Conclusion

Hsiao Chien-Wen’s dedication to innovation in photoresist removal not only enhances semiconductor manufacturing but also reflects the spirit of advancement in technology. His contributions, in collaboration with esteemed colleagues, position him as a valuable inventor in the industry, continuing to drive progress and innovation within the semiconductor landscape.