Company Filing History:
Years Active: 2023-2024
Title: Hsiao-Chen Li: Innovator in Photomask Repairing Technologies
Introduction
Hsiao-Chen Li is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photomask repairing technologies, holding 2 patents that showcase his innovative approach to enhancing lithography processes.
Latest Patents
One of his latest patents is a photomask repairing method and system designed for extreme ultra violet (EUV) lithography. This method involves providing a photomask, receiving information about it, determining a bias voltage for an electron beam writer system, and performing a repairing operation on the photomask using the specified bias voltage. Another notable patent also focuses on photomask repair, detailing a method that includes providing a multilayer stack photomask, receiving relevant information, determining a bias voltage, and executing a repair operation on the anti-reflection coating and light-absorption layer using an electron beam writer system.
Career Highlights
Hsiao-Chen Li is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in photomask technologies. His work has been instrumental in advancing the efficiency and effectiveness of lithography processes in semiconductor manufacturing.
Collaborations
He collaborates with notable colleagues such as Hao-Ming Chang and Ching-Chih Chuang, contributing to a dynamic team focused on innovation in semiconductor technologies.
Conclusion
Hsiao-Chen Li's contributions to photomask repairing methods highlight his role as a key innovator in the semiconductor industry. His patents reflect a commitment to advancing lithography technologies, ensuring continued progress in the field.