This inventor holds 1 USPTO granted patent. Top assignee: Oracle International Corporation. Active years: 2018.
Company Filing History:
Years Active: 2018
Title: Hsiangwen Lin: Innovator in Integrated Circuit Design
Introduction
Hsiangwen Lin is a notable inventor based in Menlo Park, CA (US). He has made significant contributions to the field of integrated circuit design, particularly in mitigating wire capacitance. His innovative approach has implications for enhancing the performance of electronic devices.
Latest Patents
Hsiangwen Lin holds a patent for "Mitigating wire capacitance in an integrated circuit." This patent describes systems, methods, and other embodiments associated with reducing wire capacitance. In one embodiment, the method involves loading an electronic data structure into memory, which includes a design of an integrated circuit. The design outlines layers of the integrated circuit and the connections between structures and wire interconnects. The method also includes generating a structured topology in the design by routing the wire interconnects throughout the layers based on the coordinates of the structures and weighted values associated with each structure to mitigate wire capacitance.
Career Highlights
Hsiangwen Lin is currently employed at Oracle International Corporation, where he continues to innovate in the field of integrated circuits. His work focuses on improving the efficiency and performance of electronic systems through advanced design techniques.
Collaborations
Hsiangwen Lin has collaborated with notable colleagues, including Kiran Kishore Vedantam and James Ballard. These collaborations have contributed to the advancement of technology in integrated circuit design.
Conclusion
Hsiangwen Lin's contributions to integrated circuit design, particularly in mitigating wire capacitance, highlight his role as an innovator in the field. His work at Oracle International Corporation and collaborations with other professionals underscore the importance of teamwork in driving technological advancements.
