Kaohsiung Hsien, Taiwan

Hsiang Mei Chen

USPTO Granted Patents = 19 

Average Co-Inventor Count = 1.3

ph-index = 10

Forward Citations = 320(Granted Patents)


Location History:

  • Feng Shan City, Kaohsiung, TW (1999)
  • Kaohsiung, TW (1999)
  • Feng Shan City Kaohsiung, TW (2000)
  • Kaohsiung Hsien, TW (2005 - 2006)
  • Taipei, TW (2005 - 2009)
  • Hsinchu, TW (2022 - 2023)

Company Filing History:


Years Active: 1999-2024

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19 patents (USPTO):

Title: The Innovative Contributions of Hsiang Chen: Pioneering Lithography Thermal Control

Introduction: Hsiang Chen, a prominent inventor based in Hsinchu, Taiwan, has made significant contributions to the field of lithography through his innovative patents. With a total of three patents to his name, Hsiang is recognized for his cutting-edge work in thermal control technology in lithography systems.

Latest Patents: Among Hsiang's latest patents is a remarkably sophisticated system for lithography thermal control. This patent describes a light source designed to maintain the temperature of a collector surface at or below a predetermined temperature. The sophisticated setup includes a processor, a droplet generator that creates droplets to produce extreme ultraviolet light, and a collector to reflect this light to an intermediate focus point. Furthermore, the system features a light generator for producing pre-pulse and main pulse light, alongside a thermal image capture device that records thermal images from the reflective surface of the collector.

Career Highlights: Hsiang Chen is currently associated with Taiwan Semiconductor Manufacturing Company Limited, where he continues to develop and refine technologies that contribute significantly to semiconductor manufacturing and lithography processes. His innovative work not only enhances efficiency but also ensures precision in high-tech manufacturing environments.

Collaborations: Throughout his career, Hsiang has worked closely with talented colleagues such as Sheng-Kang Yu and Li-Jui Chen. These collaborations have undoubtedly enriched his work, fostering a shared environment of innovation and excellence within their projects.

Conclusion: Hsiang Chen's contributions to lithography thermal control illustrate the profound impact of innovation in technology. As he continues to push the boundaries of what is possible in semiconductor manufacturing, his work stands as a testament to the importance of inventors in driving progress and innovation within the industry.

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