Company Filing History:
Years Active: 2022-2025
Title: Hsiang-Lung Tsou: Innovator in Semiconductor Technology
Introduction
Hsiang-Lung Tsou is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative work focuses on methods and systems that enhance semiconductor manufacturing processes.
Latest Patents
One of Hsiang-Lung Tsou's latest patents is a particle removal method. This method involves loading a particle attracting member with a coating layer into a processing chamber of a processing apparatus. The processing chamber is designed to perform a lithography exposure process on a semiconductor wafer. The method includes fixing the particle attracting member on a reticle holder during a cleaning cycle, attracting particles in the chamber through a potential difference, and subsequently loading the member out of the chamber after the cleaning cycle. Another notable patent is a semiconductor manufacturing system that includes a processing apparatus with a chamber for semiconductor processes and a transferring module for wafer handling. This system also features a particle attracting member and a monitoring device that controls the cleaning cycle to ensure optimal performance.
Career Highlights
Hsiang-Lung Tsou is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work at this company has allowed him to develop and refine his innovative ideas, contributing to advancements in semiconductor manufacturing.
Collaborations
Hsiang-Lung Tsou has collaborated with notable coworkers, including Chih-Yuan Yao and Yu-Yu Chen. Their teamwork has fostered an environment of innovation and creativity within the semiconductor field.
Conclusion
Hsiang-Lung Tsou's contributions to semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Ltd. highlight his role as a key innovator in the industry. His advancements in particle removal methods and semiconductor manufacturing systems continue to influence the field significantly.