Hsiang Chang

Title: Hsiang Chang: Innovator in Semiconductor Technology

Introduction

Hsiang Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor structure that enhances performance and efficiency.

Latest Patents

Hsiang Chang holds a patent for a semiconductor structure having a bridge layer. This semiconductor structure includes a carrier with a surface, a supporting element, a semiconductor stack, and a bridge layer. The supporting element is positioned on the surface, while the semiconductor stack is situated on the surface and features a side surface. The bridge layer consists of a first portion that connects to the supporting element, a second portion, and a third portion that connects to the semiconductor stack. The second portion extends from the third portion toward the first portion and protrudes from the side surface. This innovative design is aimed at improving the functionality of semiconductor devices.

Career Highlights

Hsiang Chang is currently employed at Epistar Corporation, a leading company in the semiconductor industry. His work at Epistar has allowed him to focus on advancing semiconductor technologies and contributing to the company's success.

Collaborations

Hsiang Chang has collaborated with several talented individuals in his field, including Yung-Fu Chang and Fan-Lei Wu. These collaborations have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Hsiang Chang's contributions to semiconductor technology through his patent and work at Epistar Corporation highlight his role as an influential inventor. His innovative designs continue to shape the future of the semiconductor industry.