Hoyung David Hwang

Title: Innovations of Hoyung David Hwang

Introduction

Hoyung David Hwang is a notable inventor based in Cupertino, California. He has made significant contributions to the field of photoresist technology, holding two patents that showcase his innovative approach to developing materials for lithography applications.

Latest Patents

One of his latest patents is titled "Dry develop process of photoresist." This invention includes a method for developing a metal oxo photoresist using a non-wet process. The method involves providing a substrate with the metal oxo photoresist in a chamber, where the unexposed regions of the photoresist have a higher carbon concentration than the exposed regions. Additionally, the method includes flowing a gas into the chamber that reacts with the unexposed regions to produce a volatile byproduct.

Another significant patent by Hwang is "Film stack for lithography applications." This patent describes methods for forming a film stack that includes a hardmask layer. The methods facilitate profile and dimension control of features through a proper profile management scheme. In one embodiment, the method for etching a hardmask layer involves forming a hardmask layer on a substrate and supplying an etching gas mixture to etch the hardmask layer exposed by a photoresist layer.

Career Highlights

Hoyung David Hwang is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on advancing technologies that enhance the efficiency and effectiveness of lithography processes.

Collaborations

Hwang has collaborated with notable colleagues such as Tejinder Singh and Suketu Arun Parikh, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Hoyung David Hwang's contributions to the field of photoresist technology through his patents reflect his commitment to innovation. His work at Applied Materials, Inc. continues to influence advancements in lithography applications.