Urbana, IL, United States of America

Howon Lee

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Lawrence Livermore National Security, LLC. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Howon Lee. Retrieved from https://idiyas.com/inventor/howon-lee-wa2xgt1u

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Howon Lee: Pioneering High Resolution Projection Micro Stereolithography

Introduction: Howon Lee is an esteemed inventor based in Urbana, IL, recognized for his contributions to the field of stereolithography. With a strong focus on enhancing microfabrication techniques, Howon has a remarkable patent to his name that represents significant innovation in high-resolution projection systems.

Latest Patents: Howon Lee holds a patent for a "High resolution projection micro stereolithography system and method." This inventive system encompasses a variety of advanced features, including the use of a far-field superlens that achieves sub-diffraction-limited features. Additionally, it incorporates multiple spatial light modulators (SLMs) for the generation of spatially-controlled three-dimensional interference holograms with nanoscale features. The integration of microfluidic components into the resin bath further enhances the capability of the PµSL system for fabricating complex microstructures from diverse materials.

Career Highlights: Howon Lee's professional journey is marked by his role at Lawrence Livermore National Security, LLC, where he applies his expertise in advanced manufacturing and materials science. His commitment to innovation has made a notable impact in the realms of 3D printing and microfabrication technology.

Collaborations: Throughout his career, Howon has collaborated with notable peers, including Christopher M. Spadaccini and George Roy Farquar. These collaborations have fostered the development of cutting-edge technologies that push the boundaries of microfabrication and materials engineering.

Conclusion: Howon Lee exemplifies the spirit of innovation in the field of stereolithography. His groundbreaking patent, along with his collaborative efforts at Lawrence Livermore National Security, LLC, contributes substantially to advancements in high-resolution microfabrication. As the demand for precision in manufacturing grows, the technologies driven by inventors like Howon will continue to inspire and shape the future of the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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