The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2016
Filed:
May. 31, 2011
Christopher M. Spadaccini, Oakland, CA (US);
George Farquar, Livermore, CA (US);
Todd Weisgraber, Brentwood, CA (US);
Steven Gemberling, Livermore, CA (US);
Nicholas Fang, Champaign, IL (US);
Jun Xu, Urbana, IL (US);
Matthew Alonso, Freeport, IL (US);
Howon Lee, Urbana, IL (US);
Christopher M. Spadaccini, Oakland, CA (US);
George Farquar, Livermore, CA (US);
Todd Weisgraber, Brentwood, CA (US);
Steven Gemberling, Livermore, CA (US);
Nicholas Fang, Champaign, IL (US);
Jun Xu, Urbana, IL (US);
Matthew Alonso, Freeport, IL (US);
Howon Lee, Urbana, IL (US);
Lawrence Livermore National Security, LLC, Livermore, CA (US);
Abstract
A high-resolution PμSL system and method incorporating one or more of the following features with a standard PμSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PμSL system to fabricate microstructures of different materials.