Howard R. Wilson is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on methods and devices that enhance the performance and efficiency of electronic components.

Latest Patents

Wilson's latest patents include a "Method and apparatus for determining the thickness of an interfacial oxide film" and a "Non-volatile memory and switching device." The first patent describes a technique for measuring the thickness of an interfacial oxide film that is crucial for the functionality of p-n junctions in semiconductor devices. This method utilizes radiant energy to stimulate carriers, allowing for precise measurements of the oxide film's thickness. The second patent outlines a non-volatile semiconductor memory and switching device that employs a Schottky barrier junction. This device features a dual-layered dielectric system that effectively traps charges, enabling the modification of conductivity characteristics based on the trapped charge's magnitude and sign.

Career Highlights

Howard R. Wilson is currently associated with International Business Machines Corporation (IBM), where he continues to innovate in the semiconductor field. His work has been instrumental in advancing technologies that are foundational to modern electronics.

Collaborations

Wilson has collaborated with notable colleagues such as Jerome D. Schick and Richard J. Murphy. Their combined expertise has contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Howard R. Wilson's contributions to semiconductor technology through his patents and work at IBM highlight his role as a key innovator in the field. His advancements continue to influence the development of electronic devices and systems.